IOE OpenIR  > 薄膜光学技术研究室(十一室)
高重复频率脉冲激光辐照光学薄膜的温升实验
代福; 熊胜明; 高卫东
Source Publication红外与激光工程
Volume37Issue:3Pages:509-512
2008
Language中文
ISSN1007-2276
Indexed By其他
Subtype期刊论文
Abstract光学薄膜是激光系统中最易损坏的薄弱环节。在高重复频率脉冲激光辐照下,光学薄膜表面温度急剧上升,导致膜层应力、结构发生变化,最后出现宏观的灾难性损伤。从实验上研究了重复频率10kHz脉冲激光辐照下光学薄膜元件的温度变化,分析了影响薄膜温度变化的众多因素。结果表明,在激光光斑确定的情况下,薄膜的温升主要取决于激光功率密度,其次是膜系最外层高折射率层的驻波场峰值,最后是膜系的吸收率及镀膜材料。
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/2078
Collection薄膜光学技术研究室(十一室)
Recommended Citation
GB/T 7714
代福,熊胜明,高卫东. 高重复频率脉冲激光辐照光学薄膜的温升实验[J]. 红外与激光工程,2008,37(3):509-512.
APA 代福,熊胜明,&高卫东.(2008).高重复频率脉冲激光辐照光学薄膜的温升实验.红外与激光工程,37(3),509-512.
MLA 代福,et al."高重复频率脉冲激光辐照光学薄膜的温升实验".红外与激光工程 37.3(2008):509-512.
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