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题名:
Sub-diffraction-limited interference photolithography with metamaterials
作者: Xu, T (Xu, Ting) ; Zhao, YH (Zhao, Yanhui) ; Ma, JX (Ma, Junxian) ; Wang, CT (Wang, Changtao) ; Cui, JH (Cui, Jianhua) ; Du, CL (Du, Chunlei) ; Luo, XG (Luo, Xiangang)
刊名: OPTICS EXPRESS
出版日期: 2008
卷号: 16, 期号:18, 页码:13579-13584 SEP 1
学科分类: 微细加工技术
文章类型: 期刊论文
中文摘要: We present that an interference lithography technique beyond the diffraction limit can be theoretically achieved by positing an anisotropic metamaterial under the conventional lithographic mask. Based on the special dispersion characteristics of the metam
收录类别: SCI ; Ei
语种: 英语
ISSN号: 1094-4105
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2047
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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Recommended Citation:
Xu, T ,Zhao, YH ,Ma, JX ,et al. Sub-diffraction-limited interference photolithography with metamaterials[J]. OPTICS EXPRESS,2008,16(18):13579-13584 SEP 1.
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