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Surface-plasmon polariton interference nanolithography based on end-fire coupling
Guo, XW; Du, JL; Luo, XG; Du, CL; Guo, YK
Source PublicationMICROELECTRONIC ENGINEERING
Volume84Pages:1037-1040
2007
Language英语
Indexed ByEi ; SCI
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1739
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorGuo, XW
Recommended Citation
GB/T 7714
Guo, XW,Du, JL,Luo, XG,et al. Surface-plasmon polariton interference nanolithography based on end-fire coupling[J]. MICROELECTRONIC ENGINEERING,2007,84:1037-1040.
APA Guo, XW,Du, JL,Luo, XG,Du, CL,&Guo, YK.(2007).Surface-plasmon polariton interference nanolithography based on end-fire coupling.MICROELECTRONIC ENGINEERING,84,1037-1040.
MLA Guo, XW,et al."Surface-plasmon polariton interference nanolithography based on end-fire coupling".MICROELECTRONIC ENGINEERING 84(2007):1037-1040.
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