IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
Suppression of pinhole defects in fullerene molecular electron beam resists
Chen, X; Robinson, APG; Manickam, M; Preece, JA
Source PublicationMICROELECTRONIC ENGINEERING
Volume84Pages:1066-1070
2007
Language英语
Indexed ByEi ; SCI
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1733
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorChen, X
Recommended Citation
GB/T 7714
Chen, X,Robinson, APG,Manickam, M,et al. Suppression of pinhole defects in fullerene molecular electron beam resists[J]. MICROELECTRONIC ENGINEERING,2007,84:1066-1070.
APA Chen, X,Robinson, APG,Manickam, M,&Preece, JA.(2007).Suppression of pinhole defects in fullerene molecular electron beam resists.MICROELECTRONIC ENGINEERING,84,1066-1070.
MLA Chen, X,et al."Suppression of pinhole defects in fullerene molecular electron beam resists".MICROELECTRONIC ENGINEERING 84(2007):1066-1070.
Files in This Item:
File Name/Size DocType Version Access License
7077.pdf(2372KB) 开放获取CC BY-NC-NDView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Chen, X]'s Articles
[Robinson, APG]'s Articles
[Manickam, M]'s Articles
Baidu academic
Similar articles in Baidu academic
[Chen, X]'s Articles
[Robinson, APG]'s Articles
[Manickam, M]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Chen, X]'s Articles
[Robinson, APG]'s Articles
[Manickam, M]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 7077.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.