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厚胶光刻中曝光光强对光化学反应速率的影响
唐雄贵
Source Publication光电工程
Volume33Issue:5Pages:36~
2006
Language中文
Indexed By其他
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1532
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding Author唐雄贵
Recommended Citation
GB/T 7714
唐雄贵. 厚胶光刻中曝光光强对光化学反应速率的影响[J]. 光电工程,2006,33(5):36~.
APA 唐雄贵.(2006).厚胶光刻中曝光光强对光化学反应速率的影响.光电工程,33(5),36~.
MLA 唐雄贵."厚胶光刻中曝光光强对光化学反应速率的影响".光电工程 33.5(2006):36~.
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