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用灰度曝光技术改善数字光刻图形轮廓
郭小伟
Source Publication光电工程
Volume33Issue:11Pages:31~
2006
Language中文
Indexed By其他
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1529
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding Author郭小伟
Recommended Citation
GB/T 7714
郭小伟. 用灰度曝光技术改善数字光刻图形轮廓[J]. 光电工程,2006,33(11):31~.
APA 郭小伟.(2006).用灰度曝光技术改善数字光刻图形轮廓.光电工程,33(11),31~.
MLA 郭小伟."用灰度曝光技术改善数字光刻图形轮廓".光电工程 33.11(2006):31~.
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