IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
烘焙工艺条件对厚胶光刻面形的影响
唐雄贵; 姚欣; 郭永康
Source Publication微细加工技术
Issue3Pages:31-
2005
Language中文
Indexed By其他
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1350
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding Author唐雄贵
Recommended Citation
GB/T 7714
唐雄贵,姚欣,郭永康. 烘焙工艺条件对厚胶光刻面形的影响[J]. 微细加工技术,2005(3):31-.
APA 唐雄贵,姚欣,&郭永康.(2005).烘焙工艺条件对厚胶光刻面形的影响.微细加工技术(3),31-.
MLA 唐雄贵,et al."烘焙工艺条件对厚胶光刻面形的影响".微细加工技术 .3(2005):31-.
Files in This Item:
File Name/Size DocType Version Access License
042.pdf(206KB) 开放获取CC BY-NC-NDView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[唐雄贵]'s Articles
[姚欣]'s Articles
[郭永康]'s Articles
Baidu academic
Similar articles in Baidu academic
[唐雄贵]'s Articles
[姚欣]'s Articles
[郭永康]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[唐雄贵]'s Articles
[姚欣]'s Articles
[郭永康]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 042.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.