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成像干涉光刻技术与离轴照明光刻技术的对比分析
刘娟; 张锦; 冯伯儒
Source Publication半导体学报
Volume26Issue:7Pages:1480-1484
2005
Language中文
Indexed By其他
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1349
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding Author刘娟
Recommended Citation
GB/T 7714
刘娟,张锦,冯伯儒. 成像干涉光刻技术与离轴照明光刻技术的对比分析[J]. 半导体学报,2005,26(7):1480-1484.
APA 刘娟,张锦,&冯伯儒.(2005).成像干涉光刻技术与离轴照明光刻技术的对比分析.半导体学报,26(7),1480-1484.
MLA 刘娟,et al."成像干涉光刻技术与离轴照明光刻技术的对比分析".半导体学报 26.7(2005):1480-1484.
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