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Variation of the deposition rate during ion beam sputter deposition of optical thin films
Liu Hongxiang; Xiong Shengming; Zhang Yundong; HongXiang Liu
Source PublicationThin Solid Films
Volume484Pages:170
2005
Language英语
Indexed BySCI
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1303
Collection薄膜光学技术研究室(十一室)
Corresponding AuthorHongXiang Liu
Recommended Citation
GB/T 7714
Liu Hongxiang,Xiong Shengming,Zhang Yundong,et al. Variation of the deposition rate during ion beam sputter deposition of optical thin films[J]. Thin Solid Films,2005,484:170.
APA Liu Hongxiang,Xiong Shengming,Zhang Yundong,&HongXiang Liu.(2005).Variation of the deposition rate during ion beam sputter deposition of optical thin films.Thin Solid Films,484,170.
MLA Liu Hongxiang,et al."Variation of the deposition rate during ion beam sputter deposition of optical thin films".Thin Solid Films 484(2005):170.
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