IOE OpenIR  > 光电技术研究所被WoS收录文章
Single closed fringe pattern phase demodulation in alignment of nanolithography
Xu, Feng1,2; Hu, Song1; Yang, Yong1; Li, Jinlong1,2; Li, Lanlan1,2
Source PublicationOPTIK
Volume124Issue:9Pages:818-823
2013
Language英语
Indexed BySCI
WOS IDWOS:000318056600010
SubtypeArticle
AbstractThe single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. (C) 2012 Elsevier GmbH. All rights reserved.
KeywordAlignment Closed Fringe Phase Demodulation 2-d Wavelet Ridge
WOS KeywordWINDOWED FOURIER-TRANSFORM ; X-RAY-LITHOGRAPHY ; MOIRE FRINGE ; INTERFEROMETRY ; SYSTEM ; EXTRACTION ; ALGORITHM
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1237
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
Recommended Citation
GB/T 7714
Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. OPTIK,2013,124(9):818-823.
APA Xu, Feng,Hu, Song,Yang, Yong,Li, Jinlong,&Li, Lanlan.(2013).Single closed fringe pattern phase demodulation in alignment of nanolithography.OPTIK,124(9),818-823.
MLA Xu, Feng,et al."Single closed fringe pattern phase demodulation in alignment of nanolithography".OPTIK 124.9(2013):818-823.
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