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题名:
A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment
作者: Li, Lanlan1,2; Hu, Song1; Zhao, Lixin1; Ma, Ping1; Li, Jinlong1,2; Zhong, Lingna1,2
刊名: OPTIK
出版日期: 2013
卷号: 124, 期号:24, 页码:6861-6865
关键词: Scanner ; Synchronization error ; Tracking error ; Phase difference
文章类型: Article
英文摘要: Quality of exposures in step and scan lithographic equipment (scanner) highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a method of increasing the correlation through reducing the phase difference between the tracking errors of the two stages is presented. Theoretical analysis with respect to application of increasing the correlation coefficients is performed. Validation of this process is verified through simulation and the results indicate that the moving average (MA) and moving standard deviation (MSD) of the synchronization error can be reduced effectively through our method. (C) 2013 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: PERFORMANCE ; SYSTEM ; DESIGN
收录类别: SCI
语种: 英语
WOS记录号: WOS:000327685700081
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/1227
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China

Recommended Citation:
Li, Lanlan,Hu, Song,Zhao, Lixin,et al. A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment[J]. OPTIK,2013,124(24):6861-6865.
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