IOE OpenIR  > 光电技术研究所被WoS收录文章
Influence of tilt moire fringe on alignment accuracy in proximity lithography
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng5; He, Yu1,3; Zhou, Shaolin4; Li, Lanlan1,3
Source PublicationOPTICS AND LASERS IN ENGINEERING
Volume51Issue:4Pages:371-381
2013-04-01
Language英语
Indexed BySCI
WOS IDWOS:000314860500006
SubtypeArticle
AbstractA moire fringe alignment method based on dual gratings is proposed. This method uses the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. (C) 2012 Elsevier Ltd. All rights reserved.
KeywordAngular Displacement Phase Tilt Moire Fringe Lithography Alignment Linear Displacement
WOS KeywordPRECISION
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:16[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/1194
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
4.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China
5.SW Univ Sci & Technol, Informat Engn Coll, Mianyang 621010, Peoples R China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moire fringe on alignment accuracy in proximity lithography[J]. OPTICS AND LASERS IN ENGINEERING,2013,51(4):371-381.
APA Zhu, Jiangping.,Hu, Song.,Yu, Junsheng.,Tang, Yan.,Xu, Feng.,...&Li, Lanlan.(2013).Influence of tilt moire fringe on alignment accuracy in proximity lithography.OPTICS AND LASERS IN ENGINEERING,51(4),371-381.
MLA Zhu, Jiangping,et al."Influence of tilt moire fringe on alignment accuracy in proximity lithography".OPTICS AND LASERS IN ENGINEERING 51.4(2013):371-381.
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