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题名:
Influence of tilt moire fringe on alignment accuracy in proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1; Xu, Feng5; He, Yu1,3; Zhou, Shaolin4; Li, Lanlan1,3
刊名: OPTICS AND LASERS IN ENGINEERING
出版日期: 2013-04-01
卷号: 51, 期号:4, 页码:371-381
关键词: Angular displacement ; Phase ; Tilt moire fringe ; Lithography alignment ; Linear displacement
文章类型: Article
英文摘要: A moire fringe alignment method based on dual gratings is proposed. This method uses the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. In practical application, the tilt moire fringe can occur due to the incorrect positions of the mask alignment mark and the wafer alignment mark or one of them. In this work, the presence of tilt moire fringe and its influence on the alignment accuracy are thoroughly analyzed. The analysis and discussions on the relationship between the revised linear displacement and the theoretical linear displacement reveal that moire fringes with different tilt angles have different influences on the alignment accuracy. Experimental results are given to verify that the proposed method is accurate and feasible, which can be applied to lithography and other correlated fields. (C) 2012 Elsevier Ltd. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: PRECISION
收录类别: SCI
语种: 英语
WOS记录号: WOS:000314860500006
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/1194
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
4.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China
5.SW Univ Sci & Technol, Informat Engn Coll, Mianyang 621010, Peoples R China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Influence of tilt moire fringe on alignment accuracy in proximity lithography[J]. OPTICS AND LASERS IN ENGINEERING,2013,51(4):371-381.
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