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题名:
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
作者: Liu, Weijing1,2; Li, Bincheng1
刊名: CHINESE OPTICS LETTERS
出版日期: 2013-05-01
卷号: 11, 期号:5
文章类型: Article
英文摘要: Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter. The "apparent" single- and two-photon absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: LASER-INDUCED ABSORPTION ; PULSE ABSORPTION ; FLUENCE ; GLASS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000321226100019
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/1192
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China

Recommended Citation:
Liu, Weijing,Li, Bincheng. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. CHINESE OPTICS LETTERS,2013,11(5).
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