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题名:
Four-quadrant gratings moire fringe alignment measurement in proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng.2; Zhou, Shaolin5; Tang, Yan1; Zhong, Min4; Zhao, Lixin1; Chen, Minyong1; Li, Lanlan1,3; He, Yu1,3; Jiang, Wei1
刊名: OPTICS EXPRESS
出版日期: 2013-02-11
卷号: 21, 期号:3, 页码:3463-3473
文章类型: Article
英文摘要: This paper aims to deal with a four-quadrant gratings alignment method benefiting from phase demodulation for proximity lithography, which combines the advantages of interferometry with image processing. Both the mask alignment mark and the wafer alignment mark consist of four sets of gratings, which bring the convenience and simplification of realization for coarse alignment and fine alignment. Four sets of moire fringes created by superposing the mask alignment mark and the wafer alignment mark are highly sensitive to the misalignment between them. And the misalignment can be easily determined through demodulating the phase of moire fringe without any external reference. Especially, the period and phase distribution of moire fringes are unaffected by the gap between the mask and the wafer, not excepting the wavelength of alignment illumination. Disturbance from the illumination can also be negligible, which enhances the technological adaptability. The experimental results bear out the feasibility and rationality of our designed approach. (C) 2013 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: X-RAY-LITHOGRAPHY ; SYSTEM ; INTERFERENCE ; PATTERNS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000315991400094
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/1157
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
4.Sichuan Univ, Sch Elect & Informat, Chengdu 610065, Peoples R China
5.S China Univ Technol, Sch Elect & Informat, Guangzhou 510640, Guangdong, Peoples R China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, Junsheng.,et al. Four-quadrant gratings moire fringe alignment measurement in proximity lithography[J]. OPTICS EXPRESS,2013,21(3):3463-3473.
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