IOE OpenIRCommunity: 应用光学研究室（二室）
http://ir.ioe.ac.cn:80/handle/311065/5
应用光学研究室（二室）
Sun, 24 May 2020 22:30:10 GMT
20200524T22:30:10Z

窗口自发辐射对于红外探测器系统性能的影响
http://ir.ioe.ac.cn:80/handle/181551/9007
Title: 窗口自发辐射对于红外探测器系统性能的影响
Authors: 金和; 任栖锋; 陈为
Description: 针对窗口自发辐射对于红外探测器系统性能产生的影响,利用ASAP软件对红外探测器窗口的自发辐射进行仿真,仿真结果以在探测器前方等效黑体辐射的方式呈现,同时红外探测器在不同温度黑体的辐射下进行实验,得到真实的等效黑体辐射。通过两种仿真结果与实验结果的对比,分析了当红外探测器探测不同温度时,两种仿真方案与实际真实值的误差,最终确定方案二适于仿真红外探测器窗口。方案二同时也可以为其他透明光学组件自发辐射的仿真建模提供参考。
Thu, 20 Dec 2018 13:35:35 GMT
http://ir.ioe.ac.cn:80/handle/181551/9007
20181220T13:35:35Z

Applying QType aspheres in the ultraviolet lithography objective lens
http://ir.ioe.ac.cn:80/handle/181551/8466
Title: Applying QType aspheres in the ultraviolet lithography objective lens
Authors: Bai, Yu; Xing, Tingwen; Jiang, Yadong
Description: Ultraviolet lithography is the most important technology for the semiconductor manufacturer. The high resolution lithography objective lens is the key component of ultraviolet lithography.Aspheres are becoming more and more popular in optical design of lens systems.For traditional aspheres, nonzero terms of over 10th order are seldom used by optical designers.In the paper,we proposes a ultraviolet lithography objective lens with QType aspheres.The working wavelength is 193.368 nm, numerical aperture is 0.75,reduction ratio is 0.25, the thickness from the first lens to object is 60mm,the thickness from the last lens to image is 8.5mm,the total track length (from object to image) is 1186mm and image field of view is 26mm×10.5mm.The optical material in ultraviolet wave band is very few,only silica and CaF2can be used in engineering project.Because CaF2material is very expensive in cost,so we choose silica as the material of ultraviolet lithography objective lens. The ultraviolet lithography objective lens is consisted of twentyThree glass,the maximal aperture is 136.5mm eight aspheric surfaces are used to correct the off axis aberration and higher order aberration.We use the QType aspheres and traditional aspheres in the ultraviolet lithography objective lens,and compare the design results. © COPYRIGHT 2016 SPIE.
Thu, 14 Jun 2018 08:00:08 GMT
http://ir.ioe.ac.cn:80/handle/181551/8466
20180614T08:00:08Z

Athermal design for midwave infrared lens with long EFFL
http://ir.ioe.ac.cn:80/handle/181551/8465
Title: Athermal design for midwave infrared lens with long EFFL
Authors: Bai, Yu; Xing, Tingwen
Description: When the environment temperature has changed, then each parameter in infrared lens has also changed, thus the image quality became bad, so athermal technology is one of key technology in designing infrared lens. The temperature influence of each parameter in infrared lens is analyzed in the paper. In the paper, an athermal midwave infrared optical system with long focal length by Codev optical design software was presented. The parameters of the athermal infrared system are 4.0 f/number, 704mm effective focal length (EFL), 1° field of view and 3.74.8 μm spectrum region 100% cold shield efficiency. When the spatial frequency is 16lp/mm, the Modulation Transfer Function (MTF) of all the field of view was above 0.5 from the working temperature range 40°C to 60°C. From the image quality and thermal analysis result, we knew that the lens had good athermal performance. © 2016 SPIE.
Thu, 14 Jun 2018 08:00:05 GMT
http://ir.ioe.ac.cn:80/handle/181551/8465
20180614T08:00:05Z

Absolute testing of surface based on subAperture stitching interferometry
http://ir.ioe.ac.cn:80/handle/181551/7503
Title: Absolute testing of surface based on subAperture stitching interferometry
Authors: Jia, Xin; Xu, Fuchao; Xie, Weimin; Xing, Tingwen
Description: LargeAperture optical elements are widely employed in highpower laser system, astronomy, and outerspace technology. SubAperture stitching is an effective way to extend the lateral and vertical dynamic range of a conventional interferometer. Most of the commercial available subAperture stitching interferometers measure the surface with a standard lens that produces a reference wavefront, and the precision of the interferometer is generally limited by the standard lens. The test accuracy can be achieved by removing the error of reference surface by the absolute testing method. In our paper we use the different subApertures as the different flats to get the profile of the reference lens. Only two lens in the testing process which is fewer than the traditional 3flat method. In the testing equipment, we add a reflective lens and a lens which can transparent and reflect to get the non rationally symmetric errors of the testing flat. The arithmetic is present in this paper which uses the absolute testing method to improve the testing accuracy of the subAperture stitching interferometers by removing the errors caused by reference surface.. © 2015 SPIE.; LargeAperture optical elements are widely employed in highpower laser system, astronomy, and outerspace technology. SubAperture stitching is an effective way to extend the lateral and vertical dynamic range of a conventional interferometer. Most of the commercial available subAperture stitching interferometers measure the surface with a standard lens that produces a reference wavefront, and the precision of the interferometer is generally limited by the standard lens. The test accuracy can be achieved by removing the error of reference surface by the absolute testing method. In our paper we use the different subApertures as the different flats to get the profile of the reference lens. Only two lens in the testing process which is fewer than the traditional 3flat method. In the testing equipment, we add a reflective lens and a lens which can transparent and reflect to get the non rationally symmetric errors of the testing flat. The arithmetic is present in this paper which uses the absolute testing method to improve the testing accuracy of the subAperture stitching interferometers by removing the errors caused by reference surface.. © 2015 SPIE.
Wed, 23 Nov 2016 08:46:12 GMT
http://ir.ioe.ac.cn:80/handle/181551/7503
20161123T08:46:12Z

Absolute testing of flats in substitching interferometer by rotationshift method
http://ir.ioe.ac.cn:80/handle/181551/7502
Title: Absolute testing of flats in substitching interferometer by rotationshift method
Authors: Jia, Xin; Xu, Fuchao; Xie, Weimin; Li, Yun; Xing, Tingwen
Description: Most of the commercial available subaperture stitching interferometers measure the surface with a standard lens that produces a reference wavefront, and the precision of the interferometer is generally limited by the standard lens. The test accuracy can be achieved by removing the error of reference surface by the absolute testing method. When the testing accuracy (repeatability and reproducibility) is close to 1nm, in addition to the reference surface, other factors will also affect the measuring accuracy such as environment, zoom magnification, stitching precision, tooling and fixture, the characteristics of optical materials and so on. We establish a stitching system in the thousand level cleanroom. The stitching system is including the Zygo interferometer, the motion system with Bilz active isolation system at level VCF. We review the traditional absolute flat testing methods and emphasize the method of rotationshift functions. According to the rotationshift method we get the profile of the reference lens and the testing lens. The problem of the rotationshift method is the tilt error. In the motion system, we control the tilt error no more than 4 second to reduce the error. In order to obtain higher testing accuracy, we analyze the influence surface shape measurement accuracy by recording the environment error with the fluke testing equipment. © 2015 SPIE.; Most of the commercial available subaperture stitching interferometers measure the surface with a standard lens that produces a reference wavefront, and the precision of the interferometer is generally limited by the standard lens. The test accuracy can be achieved by removing the error of reference surface by the absolute testing method. When the testing accuracy (repeatability and reproducibility) is close to 1nm, in addition to the reference surface, other factors will also affect the measuring accuracy such as environment, zoom magnification, stitching precision, tooling and fixture, the characteristics of optical materials and so on. We establish a stitching system in the thousand level cleanroom. The stitching system is including the Zygo interferometer, the motion system with Bilz active isolation system at level VCF. We review the traditional absolute flat testing methods and emphasize the method of rotationshift functions. According to the rotationshift method we get the profile of the reference lens and the testing lens. The problem of the rotationshift method is the tilt error. In the motion system, we control the tilt error no more than 4 second to reduce the error. In order to obtain higher testing accuracy, we analyze the influence surface shape measurement accuracy by recording the environment error with the fluke testing equipment. © 2015 SPIE.
Wed, 23 Nov 2016 08:46:08 GMT
http://ir.ioe.ac.cn:80/handle/181551/7502
20161123T08:46:08Z

Twodimension lateral shearing interferometry with dualmode
http://ir.ioe.ac.cn:80/handle/181551/7501
Title: Twodimension lateral shearing interferometry with dualmode
Authors: Liu, Zhixiang; Xin, Tingwen; Jiang, Yadong; Lv, Baobin; Xu, Fuchao
Description: Lateral shearing interferometry is an attractive technique to measure the wavefront aberration of high numerical aperture optical systems, of which using twodimensional grating can divide and shear the wavefront in twodimension simultaneously. A twodimension lateral shearing interferometer based on chessboard grating was designed, which can work in dualmode: the phase shifting mode and the Fourier transform mode. In the phase shifting mode, the phase shifting was realized by moving chessboard grating along the shearing direction in the image plane. In the Fourier transform mode, the spatial carrier frequency was realized by positioning the grating at the Talbot distance of the objective image plane. An experimental setup was designed to measure a 10×, NA0.25 microscope objective at 632.8nm wavelength. The objective was measured by the experimental setup in dualmode, the results showed that the wavefront of the objective was 0.172λ RMS; in the phase shifting mode, the repeatability (3σ) of RMS was 1.1mλ; in the Fourier transform mode, the repeatability (3σ) of RMS was 2.7mλ; after correcting the coordinates of the wavefront, the differences of Z5 to Z36 between phase shifting mode and the Fourier transform mode were better than 8mλ. © 2015 SPIE.; Lateral shearing interferometry is an attractive technique to measure the wavefront aberration of high numerical aperture optical systems, of which using twodimensional grating can divide and shear the wavefront in twodimension simultaneously. A twodimension lateral shearing interferometer based on chessboard grating was designed, which can work in dualmode: the phase shifting mode and the Fourier transform mode. In the phase shifting mode, the phase shifting was realized by moving chessboard grating along the shearing direction in the image plane. In the Fourier transform mode, the spatial carrier frequency was realized by positioning the grating at the Talbot distance of the objective image plane. An experimental setup was designed to measure a 10×, NA0.25 microscope objective at 632.8nm wavelength. The objective was measured by the experimental setup in dualmode, the results showed that the wavefront of the objective was 0.172λ RMS; in the phase shifting mode, the repeatability (3σ) of RMS was 1.1mλ; in the Fourier transform mode, the repeatability (3σ) of RMS was 2.7mλ; after correcting the coordinates of the wavefront, the differences of Z5 to Z36 between phase shifting mode and the Fourier transform mode were better than 8mλ. © 2015 SPIE.
Wed, 23 Nov 2016 08:46:04 GMT
http://ir.ioe.ac.cn:80/handle/181551/7501
20161123T08:46:04Z

共孔径消热差红外双波段光学系统
http://ir.ioe.ac.cn:80/handle/181551/7500
Title: 共孔径消热差红外双波段光学系统
Authors: 白瑜; 廖志远; 廖胜; 任栖峰; 林妩媚; 邢廷文; 蒋亚东
Description: 针对制冷型320×256中波红外凝视焦平面阵列探测器和320×256长波红外凝视焦平面阵列探测器,根据实际研制需求,设计了一套共孔径消热差折反射式红外双波段光学系统,系统工作波段为中波3.74.8μm,长波7.711.7μm,焦距均为292mm,视场角均为1.56°×1.875°,F/#均为1.93,满足100%冷光阑效率,环境温度为10℃40℃。该系统共用主镜、次镜和准直镜组,利用分光镜实现中波红外、长波红外光谱分光,后接各自的校正镜组校正剩余像差,给出了设计原理、设计过程和工程设计时需考虑的一些因素,通过选择合适的光学材料和分配光焦度,实现了两路系统在10℃40℃环境温度下取得了良...
Wed, 23 Nov 2016 08:46:01 GMT
http://ir.ioe.ac.cn:80/handle/181551/7500
20161123T08:46:01Z

Dynamic compensation for the lithographic object lens
http://ir.ioe.ac.cn:80/handle/181551/7499
Title: Dynamic compensation for the lithographic object lens
Authors: Zhu, Hongwei; Xing, Tingwen; Chen, Zexiang
Description: The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturinginduced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturinginduced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE.; The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturinginduced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturinginduced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably. © 2014 SPIE.
Wed, 23 Nov 2016 08:45:58 GMT
http://ir.ioe.ac.cn:80/handle/181551/7499
20161123T08:45:58Z

Twodimension lateral shearing interferometry for microscope objective wavefront metrology
http://ir.ioe.ac.cn:80/handle/181551/7498
Title: Twodimension lateral shearing interferometry for microscope objective wavefront metrology
Authors: Liu, Zhixiang; Xing, Tingwen; Jiang, Yadong; Lv, Baobin; Xu, Fuchao
Description: Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A twodimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in twodimension. By applying twodimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.; Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A twodimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in twodimension. By applying twodimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3if) of Z5 to Z36 at random grating position were better than 17mλ. © 2014 SPIE.
Wed, 23 Nov 2016 08:45:54 GMT
http://ir.ioe.ac.cn:80/handle/181551/7498
20161123T08:45:54Z

Numerical simulation of groundbased telescope enclosures
http://ir.ioe.ac.cn:80/handle/181551/7497
Title: Numerical simulation of groundbased telescope enclosures
Authors: Pan, Nian; Ma, Wenli; Huang, Jinlong
Description: In order to choose enclosure for the next generation telescopes, numerical simulation method was used. Firstly, the telescope, two general kinds of enclosures structure and the external flow field model were established, Then CFD(Computational Fluid Dynamics) technology was used to analyze the wind speed, static pressure, turbulence kinetic energy distribution and eddy around the telescope, when the telescope at two different pointing gestures and the external wind speed at 10m/s. The simulation results showed that when the telescope adapt the retractable enclosure, the wind speed of the main optical path between 6.1 m/s and 9.3 m/s, and the average static pressure (gauge pressure) on the primary mirror between 42.9268 Pa and 37.5579 Pa, however when telescope adapt the hemispherical enclosure, the wind speed of the main optical path between 3.4 m/s and 6.8 m/s, the average static pressure (gauge pressure) on the primary mirror between 12.1387 Pa and 11.105 Pa. Although the wind resistance of the retractable enclosure was lower than the hemispherical enclosure, no eddy generated near the main optical path, it provided the telescope a uniform flow field and ensured the quality of the image of a star. So the retractable enclosure would have better performance than the hemispherical enclosure. © 2014 SPIE.; In order to choose enclosure for the next generation telescopes, numerical simulation method was used. Firstly, the telescope, two general kinds of enclosures structure and the external flow field model were established, Then CFD(Computational Fluid Dynamics) technology was used to analyze the wind speed, static pressure, turbulence kinetic energy distribution and eddy around the telescope, when the telescope at two different pointing gestures and the external wind speed at 10m/s. The simulation results showed that when the telescope adapt the retractable enclosure, the wind speed of the main optical path between 6.1 m/s and 9.3 m/s, and the average static pressure (gauge pressure) on the primary mirror between 42.9268 Pa and 37.5579 Pa, however when telescope adapt the hemispherical enclosure, the wind speed of the main optical path between 3.4 m/s and 6.8 m/s, the average static pressure (gauge pressure) on the primary mirror between 12.1387 Pa and 11.105 Pa. Although the wind resistance of the retractable enclosure was lower than the hemispherical enclosure, no eddy generated near the main optical path, it provided the telescope a uniform flow field and ensured the quality of the image of a star. So the retractable enclosure would have better performance than the hemispherical enclosure. © 2014 SPIE.
Wed, 23 Nov 2016 08:45:51 GMT
http://ir.ioe.ac.cn:80/handle/181551/7497
20161123T08:45:51Z